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Semiconductor Quartz Flow Baffle
Semixlab Semiconductor Quartz Flow Baffle daidaitaccen kayan aikin injiniya ne wanda aka ƙera don daidaitawa da daidaita kwararar iskar gas a cikin CVD, LPCVD, PECVD, yaduwa, da tanderun oxidation. Kerarre daga matsananci-high-tsarki fused ma'adini (SiO₂, ≥99.99%), yana tabbatar da barga zafin jiki da kuma iskar gas rarraba a lokacin da wafer aiki, yadda ya kamata rage fim da rashin uniformity, barbashi gurbace, da kuma gida kan-deposition. Babban fayyace na gani, keɓaɓɓen juriya na thermal, da yanayin rashin lalacewa sun sa ya zama abin da ake buƙata a cikin ci gaba na semiconductor da kayan aikin SiC/GaN epitaxy.
description
Ⅰ. Halayen Material da Surface
● Material: Silica mai ɗorewa mai tsafta (synthetic ko quartz na halitta, tsabta ≥99.99%).
● Resistance thermal: Tsararren aiki a ci gaba da yanayin zafi har zuwa 1200 ° C.
● Ƙarshe saman: Filayen da aka goge-nau'i-nau'i masu kyau don hana mannewar barbashi.
Fadada ● - lowerarancin yadawa (5.5 × 10⁻⁷ × 10⁻⁷ / ° C) yana tabbatar da kwanciyar hankali na girma.
● Juriya na sinadarai: Ƙarfafawa zuwa iskar gas kamar HCl, NH₃, da SiH₄.
Kowane baffle mai gudana yana fuskantar tsattsauran dubawa don ingancin saman, daidaiton girma, da sarrafa kumfa na ciki, yana tabbatar da daidaiton tsafta da aminci a cikin kowane tsari na samarwa.
Ⅱ. Maɓallin Ayyuka a Tsarukan Semiconductor
Quartz Flow Baffle yana aiki azaman ainihin sarrafa kwararar kwararar ruwa da kuma yanayin yanayin zafi a cikin ɗakunan sarrafa na'urori masu zafi. Ayyukansa sun wuce kawai sarrafa iskar gas-yana taka rawar aiki da yawa wajen daidaita yanayin tsari, haɓaka amfani da kayan aiki, da tabbatar da daidaiton wafer-to-wafer.
1. Rarraba Ruwan Gas Uniform
A cikin matakai kamar LPCVD, PECVD, da epitaxy, isar da iskar gas iri ɗaya yana da mahimmanci don cimma daidaiton ci gaban fim ɗin bakin ciki da rarraba dopant. Ma'adinin ma'adini na juzu'i na juzu'i na injiniyoyi a hankali - gami da tashoshi masu gudana na kusurwa, karkatar da lanƙwasa, da ingantacciyar tazara - yana tabbatar da cewa iskar gas ɗin suna tarwatsewa daidai gwargwado a saman saman wafer. Ta hanyar kiyaye tsarin kwararar laminar, ƙwanƙolin kwarara yana tabbatar da cewa kowane wafer a cikin tsari ya sami yanayi iri ɗaya na bayyanar iskar gas, ta haka yana haɓaka kwanciyar hankali da daidaiton na'urar.
2. Tsabtace Filin thermal da Ma'aunin Canja wurin zafi
A lokacin matakan zafi mai zafi irin su thermal oxidation ko Si epitaxial girma, ko da ƙananan bambance-bambance a cikin rarraba zafin jiki na iya haifar da lahani na crystal, dislocations, ko damuwa na fim.
Quartz kwarara baffle yana aiki azaman mai daidaita yanayin zafi:
● Yana sassauta matakan zafin jiki tsakanin tsakiya da gefen jirgin ruwan wafer
● Yana rage rashin daidaituwar zafi a cikin tanderun
● Yana rage girgizar zafi yayin hawan zafi da hawan hawan hawan
3. Gurbatarwa da Tsarkake Tsarkakewa
A cikin masana'antar semiconductor, sarrafa gurɓatawa yana da mahimmanci. Ƙarfe ko gurɓataccen gurɓataccen abu na iya lalata amfanin na'urar sosai. Quartz Flow Baffle, wanda aka yi daga ultra-high-purity synthetic fused silica (SiO₂ ≥ 99.99%), ba ya gabatar da ions na ƙarfe ko ragowar carbon a cikin ɗakin sarrafawa. Its santsi, wadanda ba porous surface hana jari na dauki byproducts da barbashi zubar. Wannan yana tabbatar da kwanciyar hankali-tsaftacewa don matakai masu mahimmanci kamar samuwar gate oxide, diffusion doping, da CVD dielectric ajiya.
Semixlab Quartz Flow Baffle ba kawai abu ne mai wuce gona da iri ba 一 yana da mahimmancin tabbatar da daidaiton tsari, daidaiton iskar gas, da haɓaka yawan amfanin ƙasa. Ta hanyar ƙirar haɓakar haɓakar kwararar sa na ci gaba, daidaita yanayin zafi, da ƙayyadaddun kayan abu mai tsafta, yana tabbatar da cewa kowane wafer yana karɓar daidaitaccen yanayin tsari mai sarrafawa-mahimmanci don ƙirƙira na'urar na'ura ta gaba-gaba.
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