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CVD Tantalum Carbide (TaC) Rufi
Yawanci ana la'akari da shafan TaC lokacin da SiC ya fara isa ga iyakarsa. Wannan yana faruwa sau da yawa a cikin ci gaban SiC epitaxy ko lu'ulu'u, inda yanayin zafi da yanayin aiki suka fi buƙata.
Tare da mafi girman wurin narkewa, TaC yana kula da tsawon lokacin da ake ɗauka a yanayin zafi mai yawa, musamman a cikin muhallin da ke ɗauke da hydrogen ko HCl. A aikace, wannan yana kawo canji a cikin hanyoyin kamar haɓakar PVT, inda kwanciyar hankali na zafi ke shafar ingancin lu'ulu'u kai tsaye.
Amfanin da aka saba amfani da su sun haɗa da zoben jagora na kwarara, masu riƙe iri, sassan da suka shafi bututun ruwa, da sauran tsare-tsare a cikin filin zafi. Waɗannan sassan suna fuskantar yanayi mai tsauri na dogon lokaci, don haka rage lalacewa yana da mahimmanci. A wasu saitunan, TaC yana maye gurbin tsoffin kayan aiki kamar pBN, har ma da wasu sassan da aka shafa da SiC, kodayake wannan har yanzu ya dogara da farashi da ƙirar tsari.
