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SiC Coated Set
SiC Coated Set Disc a hankali wanda Semixlab ya ƙera an ƙera shi don biyan buƙatun abokan ciniki na semiconductor don tsananin zafin jiki, juriya na lalata, da ƙarancin gurɓataccen gurɓataccen iska a cikin manyan matakan epitaxial na zafin jiki kamar MOCVD. Wannan samfurin da aka yi da high-tsarki silicon carbide (SiC) shafi da kuma high quality-graphite abu, wanda da kyau kwarai thermal kwanciyar hankali da kuma sinadaran inertness, kuma zai iya muhimmanci inganta tsari kwanciyar hankali da daidaito na epitaxial film yadudduka.
description
SiC Mai Rufaffen Saitin Fayil
Semixlab SiC Coated Set Disc wani jigilar wafer ne wanda aka tsara don kayan aikin Aixtron MOCVD. An fi hada shi da sassa biyu masu zuwa:
1. Substrate abu: high-tsarki isostatic graphite
Siffofin kayan aiki: matsananciyar haɓakar zafin jiki (har zuwa 180 W / m · K), kwanciyar hankali mai ƙarfi a yanayin zafi mai ƙarfi, ba sauƙin lalacewa ko fashe ba.
Abũbuwan amfãni: Yana ba da daidaiton yanayin zafi mai kyau da ƙarfin tsari don wafers, wanda shine muhimmin mahimmanci don tabbatar da daidaito na tsarin girma.
2. Shafi na sama: CVD jigon SiC mai tsafta (silicon carbide)
Hanyar ajiya: Ana amfani da CVD mai haɓaka Plasma ko tsarin CVD mai zafi, kuma ana sarrafa kauri mai rufi tsakanin 50-200μm.
Bayanin fasali: Layer Layer yana da yawa kuma ba shi da pore, tare da ƙarfin injin Mohs taurin kusa da 9, kuma yana da matukar juriya ga lalata da tasirin zafin jiki.
Me yasa zabar Semixlab?
Idan kuna nema:
● SiC Coated Set Disc mai babban aiki don tsarin Aixtron.
● Maganganun dillalai waɗanda ke goyan bayan girman al'ada, sabis na gyare-gyare da yanayin lalata yanayin zafi mai zafi.
● Haɓaka masu inganci waɗanda ke haɓaka yawan amfanin MOCVD da tsawaita zagayowar kwanciyar hankali.
Da fatan za a tuntuɓe mu yanzu don samun sabbin zance da ƙayyadaddun fasaha. Muna ba da isar da saƙo na duniya da sabis na goyan bayan fasaha don taimaka muku saurin tura layin samarwa ku.
bayani dalla-dalla
Mabuɗin nazarin kaddarorin jiki
1. High zafin jiki juriya
Matsakaicin iyakar zafin aiki zai iya kaiwa 1600°C+. Tsarin sutura ba zai fashe ko kwasfa ba saboda damuwa na thermal kuma yana iya jure yanayin dauki na MOCVD mai tsayi.
2. Thermal watsin da thermal uniformity
Haɗin murfin substrate + yana sa zafin zafi ya fi dacewa kuma yana guje wa lahanin haɓakar wafer wanda zafi mara daidaituwa ya haifar. Matsakaicin gudanarwa na thermal yana tabbatar da daidaitattun rarraba kauri da abun da ke ciki, kuma yana inganta yawan amfanin ƙasa.
3. Chemical juriya lalata
A shafi iya yadda ya kamata tsayayya sosai m MOCVD tsari gas kamar hydrogen, ammonia, TMGa, da kuma TMAl. Kayan da kansa shine tsarin β-SiC mai yawa sosai kuma kusan babu halayen gefe da ke faruwa tare da iskar gas.
4. Surface sarrafa barbashi
A shafi surface yana da low roughness (Ra <0.5μm) kuma ba sauki adsorb barbashi ko kwasfa kashe. Rage gurbatawar ƙananan barbashi, musamman dacewa da manyan matakan wafer na inci 6 da sama.
Aikace-aikace
Yanayin aikace-aikacen samfur da ayyukansu
1. An tsara shi musamman don tsarin Aixtron Planetary Reactor
Ana iya amfani da su ga ɗakunan amsawa na tsarin tsarin juyayi na duniya kamar AIX 200 da AIX 2800G4.
An tsara tsarin diski daidai don tabbatar da ma'auni na thermal da ma'auni na iska na wafer yayin juyawa.
2. Muhimmiyar rawa a cikin fili semiconductor epitaxy
Ya dace da haɓakar Epitaxial na MOCVD na kayan fili na III-V daban-daban, gami da amma ba'a iyakance ga:
● GaN / AlGaN: don LEDs, lasers, na'urorin wuta.
● AlN, InGaN: don UV LEDs da manyan na'urori masu tsayi.
● GaAs / InP epitaxy: don na'urorin lantarki masu sauri da kwakwalwan sadarwa na laser.
Semiconductor guntu epitaxy masana'antu sarkar:
Semixlab Shop Product Shop
Semixlab SiC Coated Set Stores
