Semiconductor quartz wafer

Semixlab Semiconductor Quartz Wafer daidaitaccen goge-goge ne, tsaftataccen siliki mai ɗorewa wanda aka ƙera don buƙatar yanayin sarrafa semiconductor.

Ana amfani dashi ko'ina azaman dummy wafer, wafer mai ɗaukar hoto, ƙirar gani, da tushe na hoto a cikin iskar iska mai zafi, CVD/LPCVD, PECVD, da tsarin lithography.

Injiniyoyi daga 99.99% mai tsafta SiO₂, wannan ma'adini wafer yana ba da kwanciyar hankali na musamman, rashin kuzarin sinadarai, da bayyananniyar gani, yana tabbatar da barga da aiki mara lalacewa a cikin manyan layukan masana'antar semiconductor.

Ⅰ. Material da Surface Properties

● Material: Silica na roba ko na halitta (SiO₂ ≥ 99.99%).

● Zaɓuɓɓukan Diamita: 2 ", 4", 6", 8", 12" (akwai girman girman al'ada).

● farfajiya gama: goge ido biyu, lebur-gefe ≤ 5 μm, surface m ≤ 0.5 nm.

● Resistance thermal: Barga har zuwa 1200 ° C ci gaba da aiki.

● Ƙimar Ƙarfafa Ƙwararru: 5.5 × 10⁻⁷ / ° C.

● Canja wurin gani:>90% daga 190nm zuwa 2,600nm.

Kowane wafer yana jure tsananin binciken ƙasa, tabbatar da ƙima, da bincike mai tsafta don tabbatar da cikakken yarda da buƙatun matakin digiri.

Ⅱ. Maɓallin Ayyuka a Tsarukan Semiconductor

1. Mai ɗaukar tsari a cikin CVD da LPCVD Systems

Ana amfani da wafers na ma'adini azaman dummy ko spacer wafe don daidaita kwararar iskar gas da daidaiton zafin jiki yayin SiO₂, Si₃N₄, da jigon fim na bakin ciki na polysilicon. Matsakaicin girman su yana tabbatar da haɓakar fim iri ɗaya da ƙaramin tsararrun ɓangarorin a duk lokacin zagayowar ajiya.

2. Oxidation da Diffusion Furnace Aikace-aikace

A cikin matsanancin zafi da iskar shaka da hanyoyin watsawa na dopant, ma'adinan ma'adini suna aiki azaman garkuwar zafi ko masu sa ido kan tsari, kiyaye rarraba yanayin zafi iri ɗaya da hana gurɓata wafers samarwa.

3. Amfanin gani da lithography

Godiya ga babban watsawar gani na gani da daidaituwar daidaiton ma'auni, wafer ma'adini ya dace don ƙirƙira photomask, ɗumbin fiɗaɗɗen DUV, da kayan aikin daidaitawa na gani. Yana ba da garantin ingantaccen watsa haske don tsarin i-line, KrF, da tsarin lithography na ArF.

4. Plasma da Etching Muhalli

A cikin busassun etching da tsarin CVD na plasma, ana amfani da wafers ma'adini azaman garkuwar ɗaki ko tagogin plasma, suna ba da ingantaccen ƙarfin dielectric da ƙarfin sinadarai a kan iskar halogen (CF₄, SF₆, Cl₂).

5. Ƙididdigar Ƙidaya da Kayan aiki

Wafers na quartz suna aiki azaman wafers don kauri na fim, zafin jiki, da daidaitawa. Su matsananci-santsi, mara lahani saman sa daidai da kuma maimaita sakamakon auna, tabbatar da sarrafa tsari kwanciyar hankali.

Aikace-aikace na al'ada

● Dummy wafer don CVD, LPCVD, da tsarin PECVD

● Mai ɗaukar tsari ko garkuwar thermal a cikin iskar shaka da tanderun watsawa

● Photomask substrate don UV/DUV lithography

● Alamar waƙa don daidaita kayan aiki da awoyi

● Tagan dakin Plasma da kariyar tsari

Semixlab Semiconductor Quartz Wafer babban kayan aiki ne wanda aka ƙera don mafi ƙarancin tafiyar matakai na semiconductor. Tsawon yanayin zafi, daidaitaccen gani, da tsaftar sinadarai sun sa ya zama dole a cikin ajiya, oxidation, lithography, da aikace-aikacen metrology. Tare da ingantacciyar gyare-gyare da tallafin injiniya, Semixlab yana ba da mafita waɗanda ke haɓaka daidaiton tsari, amincin yawan amfanin ƙasa, da ingantaccen aiki. Muna fatan za mu zama abokin tarayya na dogon lokaci a kasar Sin.