CVD Silicon Carbide (SiC) Rufi

Rufin CVD SiC a zahiri wani yanki ne na silicon carbide da aka ajiye a kan graphite, kuma ana amfani da shi sosai a cikin kayan aikin epitaxy inda yanayin zafi da tsafta suke da mahimmanci. A cikin layin samarwa na gaske, sau da yawa za ku gan shi a cikin tsarin daga AIXTRON, ASM/LPE, Veeco, da kuma wasu dandamali masu alaƙa da AMAT. Abin da ya sa ya zama mai amfani ba wai kawai juriyar zafin jiki ba ne, har ma da kwanciyar hankali gabaɗaya yayin dogon gudu. A ƙarƙashin yanayin epitaxy na yau da kullun - hydrogen, ammonia, ko ma iskar gas mai chlorine - rufin yana kasancewa mai daidaito kuma yana kare graphite a ƙasa. Wannan yana taimakawa wajen kiyaye filin zafi ya fi daidaito kuma yana rage damar bayyanar ƙwayoyin cuta yayin girma.

A mafi yawan lokuta, ana shafa murfin a kan sassa kamar susceptors, masu ɗaukar wafer, zoben graphite, ko sassan rabin-moon. Waɗannan duk suna da hannu kai tsaye a cikin dumama wafer ko sanya shi wuri, don haka duk wani ƙaramin rashin daidaito na iya shafar yawan amfanin ƙasa. Saboda wannan dalili, galibi ana ɗaukar sassan da aka rufe a matsayin abubuwan da ake amfani da su waɗanda har yanzu suna buƙatar a dogara da su a cikin zagayowar da yawa, musamman a cikin samarwa na inci 4 zuwa 12.